But developing a new lithography technology isn't something that a single company can achieve on its own ... levels very close to lithography specifications. To increase EUV power levels ...
There are major challenges in all fronts. According to HJL Lithography, the main challenges are: 1) resists; 2) source power; 3) small depths-of-focus at 0.55 NA; 4) lens polarization control; 5) ...