the mirrors in the projection optics only reflect 72% of the incident EUV radiation at best. A typical projection lens assembly for a lithography system will include six or more mirrors ...

Figure 2: The lens for DUV photolithography with the highest ... An obvious choice is a switch to EUV lithography operating at a wavelength of 13.5 nm, and ultimately this is extremely likely ...

This scenario revolves around ASML’s current extreme ultraviolet (EUV) lithography tool (NXE:3400C) versus a completely new EUV system with a high-numerical aperture lens (EXE:5000), which is commonly ...

TSMC aims to promote mass production of the second generation of 3nm chips (N3E process) in 2024. Credit: TSMC TSMC will receive its first ASML’s most advanced High NA EUV (High Numerical Aperture ...

Andrew Grenville, chief executive of resist maker Inpria, sat down with Semiconductor Engineering to talk about photoresists for extreme ultraviolet (EUV) lithography. What follows are excerpts of ...

EUV uses lower-wavelength light (13.5-nm versus ... We view the strategic rationale of this deal through the same lens as the failed Lam Research-KLA-Tencor tie-up: Capital equipment firms are ...