Extreme ultraviolet (EUV) lithography is the next step in this trend. It uses radiation of wavelength 13.5 nm, thereby offering significant potential to extend the resolution of photolithography ...
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent ...
Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history.
Although ultraviolet (UV) light is widely known as ... 122-200 Ly-a Lyman-alpha 121.6 VUV Vacuum ultraviolet < 200 EUV Extreme ultraviolet 10-121 THIS DEFINITION IS FOR PERSONAL USE ONLY.