For decades, chipmakers have used a dry etch technology, called reactive ion etch (RIE), in the fab. RIE involves creating plasma, which is an energized gas based on charged particles (ions) and ...
The chemical etching process he used is a bit fussy, and prone to undercutting of the mask if the etchant seeps underneath it. As its name implies, RIE uses a plasma of highly reactive ions to do ...
Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...
Through via hole fabrication process by deep reactive-ion etching (DRIE): (a) Sample cleaning; (b) Deposition of mask material; (c) Transfer of desired pattern; (d) Desired pattern achieved; (e) ...
Etching seems like such an old-fashioned technique (for a time it was also an Olympic competition) that you don’t normally ...
The Microwave-Induced Plasma Etching technology addresses this need while complementing existing wet chemical processes.