Endura Volta Cobalt CVD - Applied Materials
应用材料公司的 Endura Volta CVD Cobalt 系统使公司能够在 CVD 领域保持技术领先地位,在超过 15 年的铜阻挡层/种子层 (CuBS) 开发中首次改变材料,以实现持续的高性能互连微缩。这种史无前例的技术可以沉积厚度不足 20Å 的种子 …
Endura Volta Cobalt CVD - Applied Materials
Metal-on-metal area-selective deposition-Why cobalt …
2022年1月13日 · Currently, ASD is in production in high volume manufacturing for Co capping of Cu interconnects. Interestingly, it was also attempted to implement ASD several decades ago for back-end-of-line (BEOL) gapfill using chemical …
Area-selective chemical vapor deposition of Co for Cu capping …
Area-selective chemical vapor deposition of cobalt …
2020年3月6日 · The authors describe the enhancement of the area-selective chemical vapor deposition of cobalt films on one oxide surface over another from the precursor Co 2 (CO) 8 by addition of the nucleation inhibitor ammonia (NH 3).
Tungsten and cobalt metallization: A material study for MOL local ...
- 其他用户还问了以下问题
Chemical Vapor Deposition of Cobalt and Nickel Ferrite …
2021年9月24日 · Transition metal ferrites, such as CoFe 2 O 4 (CFO) and NiFe 2 O 4 (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages …
Electromigration comparison of selective CVD cobalt capping with …
Mechanism of Cobalt Bottom-Up Filling for Advanced Node …
Low Temperature, Selective Atomic Layer Deposition of Cobalt …