Extreme ultraviolet lithography - Wikipedia
Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.
Lenses & mirrors - Lithography principles - ASML
In deep ultraviolet (DUV) lithography systems, those components are lenses; in extreme ultraviolet (EUV) systems, they’re mirrors. Each component must be correctly positioned to within a nanometer to ensure image quality.
Extreme ultraviolet lithography - Nature Reviews Methods Primers
2024年11月28日 · Extreme ultraviolet (EUV) lithography is used to fabricate features with nanometre-scale resolution. This Primer explores how EUV lithography can be applied to manufacture semiconductor devices ...
EUV lithography for chip manufacturing | ZEISS SMT
EUV lithography uses light with an extremely short wavelength of 13.5 nanometers. Thus enables structures with dimensions of less than 20 nanometers. To produce light with this wavelength, a special light source is needed. First of all, this is a high-power CO2 laser from TRUMPF.
High-NA extreme ultraviolet (EUV) lithography is currently in development. Fabrication of exposure tools and optics with a numerical aperture (NA) equal to 0.55 has started at ASML and Carl Zeiss.
EUV lithography and technology from ZEISS SMT - ZEISS Vision Care
2021年10月20日 · EUV stands for extreme ultraviolet light. With a wavelength of just 13.5 nanometers, structures can be created that are a tiny 15 nanometers in size – 5,000 times finer than a human hair.
Optics for EUV Lithography have evolved over three decades to a level where excellent imaging is demonstrated. Right now, the Starlith® 3400 Optics extends EUV Lithography to 13nm single-shot resolution with high productivity for serial production.
Extreme Ultraviolet Optics - Edmund Optics
Extreme ultraviolet (EUV) radiation encompasses the band of wavelengths from roughly 10nm to 100nm, between the X-ray and deep UV (DUV) spectral regions. With numerous pressing applications in the EUV region including lithography, nanoscale imaging, and spectroscopy, much effort has recently been focused on developing compact EUV sources.
How does a High-NA EUV Optics look like? How does it image? Can we further optimize system performance? The EUV Optical System: The finer the resolution, the larger the angles! Higher NA increases the light cone above the wafer, and... ...increases the angles on M5, and... ...increases the angular spread on M5.
EUV enters the production phase »Setup of an EUV infrastructure complete »Progress in key technology areas - Optics metrology and fabrication - Coatings - System metrology »Production of first systems accomplished The future: high NA EUV tools enable resolutions down to 11 nm