EUV lithography, which is carried out at the beam-lines M3 and B1 especially in cooperation with the Carl Zeiss SMT GmbH, is of special impor-tance here [39]. By using scattering methods, also the roughnesses of multilayer mirrors as well as nanostructures, e.g. at EUV lithography masks, can be investigated [40]. Moreover, the beamline
Support for EUV Lithography: Metrology with 13 nm Radiation - PTB
At present, extreme ultraviolet (EUV) lithography, a "next generation" technology, is starting to be realized. In support of this development, PTB is making extensive use of synchrotron radiation at wavelengths around 13 nm. The structure width of memory chips for computers is one standard example of the progress semiconductor technology is making.
7.14 EUV-Nanometrology - PTB.de
The EUV-Nanometrology group is working on the development of new measurement techniques in the field of synchrotron radiation for the characterization of nanostructured surfaces. One focus is the dimensional reconstruction of optical components for semiconductor lithography.
Physikalisch-Technische Bundesanstalt (PTB) is a scientific and technical higher federal authority within the portfolio of the Federal Ministry for EconomicAffairs and Energy. What are PTB's capabilities? PTB measures with the highest accuracy and reliability –metrology as …
The EUV metrology program of PTB - ScienceDirect
2006年4月1日 · Using stable and well-characterized synchrotron radiation, PTB performs – in cooperation with industry – the characterization of optical components (reflectometry), the calibration and characterization of EUV radiation detectors and sources and lifetime characterization of optics and sensors.
The EUV metrology program of PTB - ScienceDirect
2006年4月1日 · Using stable and well-characterized synchrotron radiation, PTB performs – in cooperation with industry – the characterization of optical components (reflectometry), the calibration and characterization of EUV radiation detectors and sources and lifetime characterization of optics and sensors.
High-accuracy EUV metrology of PTB using synchrotron radiation
2001年8月22日 · The development of EUV lithography, has made high-accuracy at-wavelength metrology necessary. Radiometry using synchrotron radiation has been performed by the German national metrology institute, the Physikalisch-Technische Bundesanstalt (PTB), for …
High-accuracy EUV metrology of PTB using synchrotron radiation
2001年1月1日 · Radiometry using synchrotron radiation has been performed by the German national metrology institute, the Physikalisch-Technische Bundesanstalt (PTB), for almost 20 years. Recently, PTB has...
Metrology with synchrotron radiation at PTB | The European …
2022年11月14日 · Besides metrology for EUV lithography, new metrology concepts for semiconductor nanostructures on wafer using EUV and soft X-ray radiation are investigated, e.g. machine learning to reconstruct periodic nanostructures with element sensitivity from angle-resolved X-ray fluorescence (Fig. 2).
(PDF) Update on EUV radiometry at PTB - Academia.edu
Utilizing a programmable-pupil-fill illuminator, the 0.3-NA microexposure tool at Lawrence Berkeley National Laboratory’s Advanced Light Source synchrotron radiation facility provides the highest resolution EUV projection printing capabilities available today. This makes it ideal for the characterization of advanced resist and mask processes.